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YANG Hong-taoª¬1 , FEI Ye-taiª¬2, CHEN Xiao-huaiª¬2, XIA Rui-xueª¬2ª¤
¡¡¡¡(1. School of Mechanical Engineering, Anhui University of Science and Technology, Huainan Anhui 232001, China; 2. School of Instrumentation Science and Opto-electronics Engineering, Hefei University of Technology, Hefei Anhui 230009, China)ª¤
¡¡¡¡Abstract:According to the Nano-CMM structure, the nanometer level error source was analyzed by applying the modern accuracy theory and the dynamics and statics mechanics. The representation form and influence of various errors were described in detail, which was the basis of subsequent error distribution and structure optimization. Due to the requirements of the accurate circumstance, structure, error distribution character and precision requirement of the Nano-CMM, the error separating tool was constituted with the micro three light beam planar reflector laser interferometer and the correlative adjustable table, which realize the synchronous separation of the standard indicating error, the yaw, pitch and roll error of the guide strip and avoid the heat and vibration influence of interferometer to separation error. At the same time, the additive error created by the nonreal-time measurement of the single function instruments is avoided too. The validity and reliability of the facility is verified by the actual error separation result. ª¤
¡¡¡¡Key words: Nano-CMM; error source analysis; laser interferometer; error separationª¤ª¤
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